首页> 外国专利> PROCESS FOR SURFACE-GRAFTING OF FORMED MATERIALS, IN PARTICULAR ALSO MICROPOROUS MEMBRANES MADE FROM NITROGEN CONTAINING POLYMERS

PROCESS FOR SURFACE-GRAFTING OF FORMED MATERIALS, IN PARTICULAR ALSO MICROPOROUS MEMBRANES MADE FROM NITROGEN CONTAINING POLYMERS

机译:特殊制得的含氮聚合物微孔膜的成形材料的表面接枝工艺

摘要

PCT No. PCT/EP90/01498 Sec. 371 Date May 1, 1992 Sec. 102(e) Date May 1, 1992 PCT Filed Sep. 6, 1990 PCT Pub. No. WO91/03310 PCT Pub. Date Mar. 21, 1991.Halogen-substitutable hydrogen atoms are linked to nitrogen atoms of a polymer, with ethylenically-unsaturated monomers. By using inorganic or organic hypohalogenites and/or organic N-halogen derivatives as halogenation means, hydrogen atoms on the nitrogen atoms of the polymer membranes or polymer formed materials are replaced by halogen atoms and part of these are removed by reducing agents in the presence of ethylenically unsaturated monomers, with radical grafting of these on to the nitrogen atoms, after which the remaining halogen atoms are removed by reducing agents in the absence of monomers.
机译:PCT号PCT / EP90 / 01498第二部分371日期1992年5月1日102(e)日期,1992年5月1日,PCT,1990年9月6日提交,PCT公开。 PCT公开号WO91 / 03310。 1991年3月21日发布。可烯键式不饱和单体将卤素可取代的氢原子连接到聚合物的氮原子上。通过使用无机或有机次卤酸盐和/或有机N卤素衍生物作为卤化手段,聚合物膜或聚合物形成的材料的氮原子上的氢原子被卤素原子取代,并且在存在氮原子的情况下通过还原剂将其部分除去。烯键式不饱和单体,将它们自由基接枝到氮原子上,然后在不存在单体的情况下,通过还原剂除去其余的卤素原子。

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