highly sensitive, high resolution positivresist for electron beams.

摘要

There is proposed a positive-type electron-beam resist having high sensitivity and resolution suitable for use in manufacturing an LSIC of 16-megabit or more. The positive-type electron-beam resist consists of mono-polymer of cyclohexyl-2-cyanoacrylate or a copolymer of alkyl-2-cyanocrylate and cyclohexyl-2-cyanoacrylate represented by following formula (I): CHEM (wherein R represents an alkyl group having 1 to 2 carbon atoms and a molar ratio n/m = 0 to 0.4) and having a weight-average molecular weight (Mw) of 100,000 to 1,500,000. A method of forming a pattern of the positive-type electon-beam resist is also disclosed. This method is characterized by using as a developing solution a mixed solvent comprising an organic solvent and an organic non-solvent.