首页> 外国专利> Process for producing the depot direct or indirect harmful effects with a layer of hard chromium, like certain enzymes in the corrosion.

Process for producing the depot direct or indirect harmful effects with a layer of hard chromium, like certain enzymes in the corrosion.

机译:用一层硬铬(如腐蚀中的某些酶)产生长效直接或间接有害作用的过程。

摘要

According to this process, in order to deposit a layer of hard chromium, is carried out with a pulse-wise direct current having a frequency of pulses between a critical value, lower and a value of the critical frequency greater than (f0) determined, the critical frequency greater than (f0) being determined for a current efficiency is optimized, and this so that for frequencies increases until it reaches this frequency (f0), it passes from a deposit a brilliant without cracks to deposit a glossy with increasingly of cracks and, in the zone between the critical frequency of less than and greater than this critical frequency is chosen, the duration of application of the direct current pulses in order to obtain a shiny deposit practically no cracks. & br / application, in particular, the deposition of a layer of hard chromium on the machined parts made of steel.
机译:根据该过程,为了沉积硬铬层,使用脉冲式直流电进行,脉冲式直流电的脉冲频率在确定的临界值以下和临界频率值大于(f0)之间,优化了为电流效率确定的大于(f0)的临界频率,这样对于频率增加,直到达到该频率(f0),它从无裂纹的光亮过渡到裂纹不断增长的光泽面并且,在临界频率小于和大于该临界频率之间的区域中,选择直流脉冲的施加持续时间以便获得闪亮的沉积​​物,实际上没有裂纹。 &尤其是在钢制的机械零件上沉积一层硬铬。

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