PURPOSE: To provide molecular beam source cells, which are respectively always capable of measuring the intensity of a molecular beam, which is generated in each molecular beam source cell during the formation of a thin film, in every molecular beam source cell, and a molecular-beam epitaxial growth device. ;CONSTITUTION: An intensity-of-molecular-beam measuring device 22 is attached to each molecular beam source cell 20. molecular-beam epitaxial growth device is provided with the cells 20, which are respectively mounted with each device 22. It is desirable that the growth device is further provided with a control mechanism for controlling the intensities of molecular beams, which are emitted from the cells 20, on the basis of the intensities of the molecular beams measured by the devices 22. Each device 22 can be constituted of an ion gauge type measurer or a resistance wire.;COPYRIGHT: (C)1995,JPO
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