首页> 外国专利> PERIODIC DIELECTRIC STRUCTURE FOR PRODUCTION OF PHOTONIC BAND GAP AND DEVICES INCORPORATING THE SAME.

PERIODIC DIELECTRIC STRUCTURE FOR PRODUCTION OF PHOTONIC BAND GAP AND DEVICES INCORPORATING THE SAME.

机译:周期性的介电结构,用于生产光子带隙和包含相同的装置。

摘要

A method for fabricating a periodic dielectric structure which exhibits a photonic band gap. Alignment holes are formed in a wafer of dielectric material having a given crystal orientation. A planar layer of elongate rods is then formed in a section of the wafer. The formation of the rods includes the step of selectively removing the dielectric material of the wafer between the rods. The formation of alignment holes and layers of elongate rods and wafers is then repeated to form a plurality of patterned wafers. A stack of patterned wafers is then formed by rotating each successive wafer with respect to the next-previous wafer, and then placing the successive wafer on the stack. This stacking results in a stack of patterned wafers having a four-layer periodicity exhibiting a photonic band gap.
机译:一种制造具有光子带隙的周期性电介质结构的方法。在具有给定晶体取向的电介质材料的晶片中形成对准孔。然后,在晶片的一部分中形成细长杆的平面层。杆的形成包括选择性地去除杆之间的晶片的电介质材料的步骤。然后重复对准孔以及细长杆和晶片的层的形成以形成多个图案化的晶片。然后通过相对于下一个先前的晶片旋转每个连续的晶片,然后将连续的晶片放置在堆叠上来形成图案化的晶片的堆叠。这种堆叠导致具有四层周期性的图案化晶片的堆叠,所述四层周期性呈现出光子带隙。

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