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Mechanically strained multiquantum well semiconductor laser device

机译:机械应变多量子阱半导体激光器件

摘要

The laser is formed with a multi quantum well, MQW, layer (3) that consists of alternate layers of 5nm thick well regions and 5nm thick barrier layers. At least one transition region between a well region and a barrier region are provided on both sides of the main region to which a mechanical strain is applied. The mechanical strain is varied gradually along the border region from the main region to the neighbouring well and barrier layers in the direction of the border region. The difference in the strain between the initial and neighbouring layers is smaller than the difference in the mechanical strain between its main region and the main region of the neighbouring layers.
机译:激光器形成有多量子阱MQW层(3),该层由5nm厚的阱区和5nm厚的势垒层的交替层组成。阱区和势垒区之间的至少一个过渡区设置在要施加机械应变的主区的两侧。机械应变沿着边界区域从主区域到相邻的阱和势垒层沿边界区域的方向逐渐变化。初始层与相邻层之间的应变差小于其主要区域与相邻层的主要区域之间的机械应变差。

著录项

  • 公开/公告号DE19651352A1

    专利类型

  • 公开/公告日1997-09-04

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI K.K. TOKIO/TOKYO JP;

    申请/专利号DE1996151352

  • 发明设计人

    申请日1996-12-10

  • 分类号H01S3/19;H01L29/15;H01L21/20;

  • 国家 DE

  • 入库时间 2022-08-22 03:14:39

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