EVALUATION METHOD FOR EXCIMER LASER IRRADIATION INITIAL ABSORPTION OF SYNTHESIZED QUARTZ GLASS MEMBER AND PHOTO-EXPOSURE DEVICE USING SYNTHESIZED GLASS MEMBER EVALUATED BY THE METHOD

摘要

PROBLEM TO BE SOLVED: To establish an evaluation method for irradiation initial absorption capable of predicting simply and quickly the irradiation initial absorption generated when excimer laser is projected onto a synthesized quartz glass. ;SOLUTION: From an excimer lamp, light having a center wavelength of 172nm of less is projected onto a synthesized quartz glass member, followed by the measurement of the absorption in an absorption band of 215nm wavelength light generated in the glass member in association with irradiation. On the basis of the absorption in the 215nm absorption band, prediction is made for the irradiation initial absorption amount generated when the glass member is irradiated with a KrF or ArF excimer laser beam.;COPYRIGHT: (C)1998,JPO