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METHOD AND DEVICE FOR THE DEPOSIT OF AT LEAST ONE FILM OF INTRINSIC MICROCRYSTALLINE OR NANOCRYSTALLINE HYDROGENATED SILICON AND PHOTOVOLTAIC CELL OBTAINED BY THIS METHOD
METHOD AND DEVICE FOR THE DEPOSIT OF AT LEAST ONE FILM OF INTRINSIC MICROCRYSTALLINE OR NANOCRYSTALLINE HYDROGENATED SILICON AND PHOTOVOLTAIC CELL OBTAINED BY THIS METHOD
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机译:通过该方法获得的至少一层本征微晶或纳米晶氢化硅和光伏电池的沉积方法和装置
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摘要
The device (10) comprises a deposition chamber (12) containing two electrodes (13, 14), one of which comprises a support (16) for a substrate (17) and is earthed, the other being connected to an electric radio frequency generator (15). The device includes a mechanism (23) for extracting gas from the chamber (12) and a mechanism (18) for supplying gas. The device also comprises a mechanism for purification (31) of the gases introduced into the chamber, these a mechanism being arranged so as to reduce the number of oxygen atoms contained in the deposition gas, such gas being made up of silane, hydrogen and/or argon. The procedure consists of creating a vacuum in the deposition chamber (12), purifying the gases using purification a mechanism (31), introducing these purified gases into the chamber (12), then creating a plasma between the electrodes (13, 14). A film of intrinsic microcrystalline silicon in then deposited on the substrate.
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