the crux of the problem in the study of chemical polishing.

摘要

according to the invention, in order to achieve high precision, a chemical mechanical polishing of semiconductor device manufacturing, especially in the formation of a wiring layer for chemical mechanical polishing, high grinding rate display, the choice of insulation film and the etching of high marks, and the light is.... neutral display, semiconductor device properties become inferior to metal containing component, and the price of the special chemical reagent is not necessary, but also on the human body harmful substances, the main component of the disease is not uacc4uc5f0ub9c8 chemical polishing to provide a water the task is solved, and the means of checking, organic content, oxidizing agent and water and saline of ph 5 to 9, the court will be a feature.