METHOD AND APPARATUS FOR FABRICATION OF MICRO-STRUCTURES USING NON-PLANAR, EXPOSURE BEAM LITHOGRAPHY

摘要

Apparatus for non-planar treatment of a workpieceutilizing exposure beam lithography includes a vacuumchamber an exposure beam generator such as an electronbeam generator disposed in the chamber for directing abeam towards a work location, a chuck disposed in thechamber for holding and positioning the workpiece at thework location, a rotary motorized stage disposed in thechamber and responsive to first control signals forselectively rotating the chuck, and thus the workpiece,to thereby expose different areas of the workpiece tothe beam, and a linear motorized stage disposed in thechamber on which the rotary stage is mounted, saidlinear motor being responsive to second control signalsfor selectively moving the rotary stage and thus thechuck and workpiece in a linear direction which isgenerally parallel with the axis of rotation of therotary stage. The workpiece is thus exposed overadditional areas by operation of the linear stage. Acontroller supplies first and second control signals tothe rotary stage and linear stage respectively toselectively effect the operation thereof.