首页> 外国专利> Flourochemical composition containing a condensation product of a flourochemicalpolyether and a poly-isocyanate to impart stain release properties to a substra te

Flourochemical composition containing a condensation product of a flourochemicalpolyether and a poly-isocyanate to impart stain release properties to a substra te

机译:包含氟化学聚醚和多异氰酸酯的缩合产物的氟化学组合物,以赋予基质以去污性能

摘要

This invention discloses a fluorochemical composition comprising a condensation product of a diisocyanate or triisocyanate and at least one polyether obtainable by reacting a fluorochemical substituted epoxide of formula (I) with a compound of formula (II) HX1-B-X2H or (III) (Rf')k-L2-X2H wherein: B represents an organic residue obtained by removing the groups HX1 and HX2 from the compound in formula (II); X1 and X2 are each independently selected from the group consisting of O, NH and S; L1 represents an organic divalent linking group; L2 represents an organic linking group having a valence of k+1; k is an integer of 1 to 10; Rf and Rf' are each independently selected from the group consisting of perfluorinated and partially fluorinated aliphatic groups; s is 0 or 1; and a is 0 or 1. The fluorochemical composition is particularly suitable for imparting stain release properties to a substrate. Further disclosed are a method of preparation of the fluorochemical composition and a method of treatment of a substrate with the fluorochemical composition.
机译:本发明公开了一种含氟化合物组合物,其包含二异氰酸酯或三异氰酸酯与至少一种聚醚的缩合产物,所述聚醚可通过使式(I)的含氟化合物取代的环氧化物与式(II)的化合物HX 1 -BX 2 H反应而获得。或(III)(Rf′)kL 2 -X 2 H,其中:B表示通过从式(II)的化合物中除去基团HX 1和HX 2所获得的有机残基;或X 1和X 2各自独立地选自由O,NH和S组成的组; L 1表示有机二价连接基团; L 2表示化合价为k + 1的有机连接基。 k是1至10的整数; Rf和Rf'各自独立地选自全氟和部分氟化的脂族基团; s是0或1; a为0或1。含氟化合物组合物特别适用于赋予基材去污性能。还公开了一种含氟化合物组合物的制备方法和用该含氟化合物组合物处理基材的方法。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号