首页> 外国专利> Wafer adsorption table for foil mount process for semiconductor package manufacturing

Wafer adsorption table for foil mount process for semiconductor package manufacturing

机译:晶圆吸附台,用于半导体封装制造的箔安装工艺

摘要

The present invention improves the structure of the wafer adsorption table used in the foil mount process for semiconductor package manufacturing so that it can be used for general purposes, thereby reducing the inconvenience and cost for replacing the wafers every time. It is to reduce.;To this end, the present invention is a wafer adsorption table for adsorbing a wafer under vacuum pressure; A center zone 3 having an air blow hole 2 is formed in the center of the wafer adsorption table 1, and a circular recessed surface 4 around the air blow hole 2 along a radial direction; There is provided a wafer adsorption table in a foil mounting process for manufacturing a semiconductor package in which circular seating portions 6 having a vacuum hole 5 are alternately formed.
机译:本发明改进了用于半导体封装制造的箔安装工艺中的晶片吸附台的结构,使得其可以用于一般目的,从而减少了每次更换晶片的不便和成本。为此,本发明是一种用于在真空压力下吸附晶片的晶片吸附台。在晶片吸附台1的中央形成有具有气孔2的中央区域3,在该气孔2的周围沿径向形成有圆形的凹面4,该圆形的凹面4形成在晶片吸附台1的中央。提供了一种在箔片安装过程中的晶片吸附台,用于制造半导体封装,其中交替地形成具有真空孔5的圆形安置部6。

著录项

  • 公开/公告号KR19990018153U

    专利类型

  • 公开/公告日1999-06-05

    原文格式PDF

  • 申请/专利权人 구본준;

    申请/专利号KR19970031371U

  • 发明设计人 김진구;

    申请日1997-11-07

  • 分类号H01L21/52;

  • 国家 KR

  • 入库时间 2022-08-22 02:14:17

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号