PROJECTION ALIGNER, MASK STRUCTURE USED FOR THE SAME, EXPOSURE METHOD, SEMICONDUCTOR DEVICE MANUFACTURED USING THE PROJECTION ALIGNER, AND MANUFACTURE OF THE SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To extend service life of a mask and to prevent decrease in exposure accuracy by preventing adhesion and deposition of contamination onto the surface of a mask. ;SOLUTION: A mask structure body E having a light catalyst at least in part is used, and an auxiliary light source K for applying auxiliary light appropriate to the mask structural in a chamber N, that is separate from an exposure chamber O, is provided. Another chamber N may be newly provided or a mask cassette chamber for storing the mask structure, when no exposure is made to a body F to be transferred. The auxiliary light source K can also be provided at the exposure chamber O.;COPYRIGHT: (C)2000,JPO