CHEMICAL AMPLIFICATION TYPE PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To increase dissolution contrast and to improve resolution performance by suppressing the occurrence of the reverse reaction in an elimination reaction of protective groups. ;SOLUTION: The chemical amplification type photoresist comprises a base resin having such characteristic that the resin becomes insoluble in a basic developing liquid when the specific positions of the resin are linked with protective groups and the resin becomes soluble in the basic developing liquid when the protective groups of the resin are eliminated, a photo-acid generating agent which generates hydrogen ion when it is exposed to light and an agent inhibiting reverse reaction. The base resin can be solubilized in the basic developing liquid by elimination of the protective group by the reaction of the base resin with hydrogen ion generated from the photo-acid generating agent and the solubilization of the base resin into the basic developing liquid is amplified by the generation of new hydrogen ion. The agent inhibiting reverse reaction inhibits recombination reaction of the eliminated protective groups to the base resin.;COPYRIGHT: (C)2000,JPO