NICKEL-IRON ALLOY SPUTTERING TARGET FOR FORMING MAGNETIC THIN FILM, PRODUCTION OF MAGNETIC THIN FILM AND NICKEL-IRON ALLOY SPUTTERING TARGET FOR FORMING MAGNETIC THIN FILM

摘要

PROBLEM TO BE SOLVED: To produce an Ni-Fe alloy material suitable for the use for forming a ferromagnetic Ni-Fe alloy thin film, furthermore small in the generation of particles at the time of sputtering and good in corrosion resistance and magnetic properties as well and to provide a method for producing the same. SOLUTION: This Ni-Fe alloy sputtering target for forming a magnetic thin film is the one in which the content of oxygen is =50 ppm, the content of S is =10 ppm, the content of carbon is =50 ppm, and the total content of metallic impurities other than alloying components is =50 ppm. It is produced by subjecting a high purity material obtd. by dissolving a raw material with chloric acid and executing ion exchanging, activated carbon treatment and electrolytic refining to melting and executing alloying.