首页> 外国专利> METHOD OF MANUFACTURING PHOTOCATALYTIC ACTIVE MATERIAL FOR GAS PHASE AND PHOTOCATALYTIC ACTIVE MATERIAL FOR GAS PHASE

METHOD OF MANUFACTURING PHOTOCATALYTIC ACTIVE MATERIAL FOR GAS PHASE AND PHOTOCATALYTIC ACTIVE MATERIAL FOR GAS PHASE

机译:气相的光催化活性材料的制备方法和气相的光催化活性材料的制备方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method for a photocatalytic active material for gas phase excellent in photocatalytic activity and capable of decomposing a harmful material in gas in a short time and to provide the photocatalytic active material for gas phase. SOLUTION: The photocatalytic active material for gas phase is manufactured by forming a photocatalyst layer containing the photocatalytic active material and bringing the photocatalyst layer into contact with the liquid containing water or forming the photocatalyst layer containing the photocatalytic active material and a water-retaining material and bringing the photocatalyst layer into contact with the liquid containing the water or putting the photocatalyst layer in an atmosphere containing moisture. In the photocatalytic active material for gas phase, the water content R expressed by formula (I) (Aw is the weight of the moisture in the photocatalyst layer, Ap is the weight of the photocatalytic active material) is =1 wt.%. R(%)=[Aw/(Aw+Ap)]100... (I).
机译:解决的问题:提供一种用于光催化活性优异并且能够在短时间内分解气体中的有害物质的气相的光催化活性物质的制造方法,并提供一种用于气相的光催化活性物质。解决方案:气相光催化活性材料是通过形成包含光催化活性材料的光催化剂层,并使光催化剂层与含水液体接触,或形成包含光催化活性材料和保水材料的光催化剂层而制成的。使光催化剂层与含有水的液体接触或将光催化剂层置于含有水分的气氛中。在气相的光催化活性材料中,由式(I)表示的水含量R(Aw是光催化剂层中的水分的重量,Ap是光催化活性材料的重量)≥1重量%。 R(%)= [Aw /(Aw + Ap)] 100 ...(I)。

著录项

  • 公开/公告号JP2001276614A

    专利类型

  • 公开/公告日2001-10-09

    原文格式PDF

  • 申请/专利权人 HOYA CORP;

    申请/专利号JP20000097171

  • 发明设计人 OGAWA SHINICHI;

    申请日2000-03-31

  • 分类号B01J21/06;B01D53/86;B01D53/94;B01J21/08;B01J21/16;B01J35/02;F01N3/02;F01N3/08;

  • 国家 JP

  • 入库时间 2022-08-22 01:28:51

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