Apparatus to expose cultures in culture flasks to a gas medium has a gas inlet into a common eddy chamber to flow through guides into the flasks and be delivered to the whole culture surface

摘要

Apparatus for exposing a culture (23) to a gas medium in a culture flask (22), comprising spreading the gas medium over the whole surface of the culture (23) to give a targeted flow, is new. Apparatus for exposing a culture (23) to a gas medium in a culture flask (22), comprises spreading the gas medium over the surface of the culture. The apparatus has an inlet (44) for the gas medium and a gas outlet, with the culture (23) in the culture flask (22) between them. A pressure control maintains a constant pressure difference between the gas inlet (44) and the outlet. The gas flow guide system has at least one inflow guide (40) with one end (41a) immersed into the culture flask (22) and the other end (41b) aligned to take the gas flow from the inlet (44). The gas inflow guide (40) is a cylindrical tube, which extends deeply into the common gas eddy chamber (34), and the gas outflow guide (42) is a straight tube with its outflow end (43b) opening into the common outflow chamber (38). Independent claims are included for the following: (1) the exposure of a culture (23) to a gas medium within culture flasks (22), so that the gas flow is passed over the whole culture surface, where the gas is homogenized by eddying between the gas inlet (44) and the gas guides (40,42); and (2) a culture exposure system to hold at least one culture flask (22), and a feed to deliver a fluid medium into the flasks containing the culture (23), where a mechanism positions the flasks (22) automatically into the apparatus for the culture to be exposed to a gas medium.