Method and system of multi-band UV illumination of wafers for optical test and measurement systems employing microscopes with wafer images processed using special data processing algorithms

摘要

A UV lamp with a UV spectrum with two narrow band widths of 360-370 nm and 398-407 nm and a visible light spectrum with a single narrow band width of 427-434 nm illuminates the wafer. The microscope has a wide band objective system permitting the passage of multi-band UV light and a wide band tubular lens for focussing the reflected light from the wafer onto a camera. The wafer images are processed using special data processing algorithms