首页> 外国专利> Gas purification equipment produces first free radicals from plasma generated between electrodes and secondary free radicals by electrons released photoelectrically from substrate

Gas purification equipment produces first free radicals from plasma generated between electrodes and secondary free radicals by electrons released photoelectrically from substrate

机译:气体净化设备从电极之间产生的等离子体中产生第一自由基,并通过从基板上光电释放的电子产生第二自由基

摘要

Gas purification equipment has electrode(s) and counter electrode(s) on a substrate adjacent a gas stream. A plasma is generated by a discharge between each electrode and counter electrode. The plasma generates free radicals to purify the gas. Secondary free radicals to purify the gas are produced by electrons released from the substrate due to a photoelectric action on the substrate. An Independent claim is included for the following: (a) Purifying a gas as above. Preferred Features: The discharge is produced by applying intermittent pulses between the electrodes and counter electrodes. The secondary free radicals are produced by irradiating the substrate with light - 50 nm and preferably 250 - 400 nm.
机译:气体净化设备在与气流相邻的基板上具有电极和对电极。通过每个电极和对电极之间的放电产生等离子体。等离子体产生自由基以净化气体。由于对衬底的光电作用,从衬底释放的电子产生了用于净化气体的次级自由基。独立索赔包括以下内容:(a)净化上述气体。优选特征:通过在电极和对电极之间施加间歇脉冲来产生放电。次级自由基是通过用约50 nm,优选250-400 nm的光照射底物而产生的。

著录项

  • 公开/公告号FR2798077A1

    专利类型

  • 公开/公告日2001-03-09

    原文格式PDF

  • 申请/专利权人 LAB SA;

    申请/专利号FR19990011192

  • 发明设计人 SIRET BERNARD;GOLDMAN MAX;

    申请日1999-09-03

  • 分类号B01D53/32;B01J19/12;

  • 国家 FR

  • 入库时间 2022-08-22 01:07:49

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