首页> 外国专利> Semiconductor memory device having a first source line arranged between a memory cell string and bit lines in the direction crossing the bit lines and a second source line arranged in parallel to the bit lines

Semiconductor memory device having a first source line arranged between a memory cell string and bit lines in the direction crossing the bit lines and a second source line arranged in parallel to the bit lines

机译:半导体存储器件具有:第一源极线,其在与位线交叉的方向上布置在存储单元串和位线之间;以及第二源极线,其平行于位线布置

摘要

A semiconductor device comprises select gates and control gates of a plurality of memory cells therebetween so that gate members on upper portions of stacked gates may cross element regions. A metal interconnection is disposed parallel to an upper layer of the element region. A source line SL is arranged at intervals of plural bit lines BL. The source line is led to a source line contact through a conductive member composed of a low-resistance metal in the same manner as a bit line contact.
机译:半导体器件包括在其间的多个存储单元的选择栅和控制栅,使得堆叠栅的上部上的栅构件可以与元件区交叉。金属互连平行于元件区域的上层设置。源极线SL以多条位线BL的间隔布置。以与位线接触相同的方式,通过由低电阻金属构成的导电构件将源极线引向源极线接触。

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