首页> 外国专利> Photolithographic position measuring laser interferometer with relitively moving measuring intereometer

Photolithographic position measuring laser interferometer with relitively moving measuring intereometer

机译:具有相对移动的测量干涉仪的光刻位置测量激光干涉仪

摘要

A laser interferometer for detecting the position of a moving object in a Y-direction when the object moves in an X-direction has a separating optical system that moves in the X-direction at a speed different from that of the moving object. A laser beam is separated by the separating optical system into a reference beam and a measurement beam, which are individually directed toward a reference mirror and a moving mirror on the moving object. The light of the measurement beam reflected from the moving mirror, and the light of the reference beam reflected from the reference mirror are received by a photodetector via the separating optical system, and the photoelectric conversion signal of the interference light is output as information concerning the position of the moving object in the Y-direction. A fixed mirror that is shorter than the moving object can be used because the separating optical system also moves in the X-direction.
机译:用于在物体在X方向上移动时检测在Y方向上的移动物体的位置的激光干涉仪具有以与移动物体不同的速度在X方向上移动的分离光学系统。激光束被分离光学系统分离成参考光束和测量光束,它们分别指向运动物体上的参考镜和运动镜。从移动镜反射的测量光束的光和从参考镜反射的参考光束的光经由分离光学系统被光电检测器接收,并且干涉光的光电转换信号被输出为与光的反射有关的信息。运动对象在Y方向上的位置。可以使用比移动物体短的固定镜,因为分离光学系统也沿X方向移动。

著录项

  • 公开/公告号US6211965B1

    专利类型

  • 公开/公告日2001-04-03

    原文格式PDF

  • 申请/专利权人 NIKON CORPORATION;

    申请/专利号US19990377181

  • 发明设计人 JUNJI HAZAMA;MAKOTO TSUCHIYA;

    申请日1999-08-19

  • 分类号G01B90/20;

  • 国家 US

  • 入库时间 2022-08-22 01:04:44

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