首页> 外国专利> Layout design manner of transistor optimization manner and the device and the integrated circuit and record the device and the transistor optimization program record media, record the layout design program of the integrated circuit record media, and the integrated circuit

Layout design manner of transistor optimization manner and the device and the integrated circuit and record the device and the transistor optimization program record media, record the layout design program of the integrated circuit record media, and the integrated circuit

机译:晶体管优化方式及器件和集成电路的布局设计方式,并记录器件和晶体管优化程序记录介质,记录集成电路记录介质和集成电路的布局设计程序

摘要

PROBLEM TO BE SOLVED: To optimize the size of a transistor in combination with the number of turning steps in the design of an integrated circuit. ;SOLUTION: The size of a transistor and the number of turning steps are optimized using a turning model wherein the number of a plurality of turning steps is set to one transistor size. In this turning model, when the lower limit value of the transistor size W is assumbed to be W0 and the height of a layout region is assumed to be H0, the number N of the turning steps can be arbitrarily set in the range of W/H0≤N≤W/W0. By optimizing the size of the transistor along with the number of the turning steps in the range to satisfy a given design constraint using this model, an integrated circuit, which is excellent in the aspects of area and performance, can be designed.;COPYRIGHT: (C)2000,JPO
机译:要解决的问题:在集成电路设计中结合旋转步骤的数量来优化晶体管的尺寸。解决方案:晶体管的尺寸和匝数的数量是使用一个匝数模型优化的,其中多个匝数的数量设置为一个晶体管的大小。在该旋转模型中,当将晶体管尺寸W的下限值假定为W0并且将布局区域的高度假定为H0时,可以将旋转步骤的数量N设置在W /的范围内。 H0≤ N≤ W / W0。通过使用该模型优化晶体管的尺寸以及该范围内的旋转步骤数以满足给定的设计约束,可以设计出一种在面积和性能方面都非常出色的集成电路。日本特许(C)2000

著录项

  • 公开/公告号JP3315391B2

    专利类型

  • 公开/公告日2002-08-19

    原文格式PDF

  • 申请/专利权人 松下電器産業株式会社;

    申请/专利号JP20000042380

  • 发明设计人 福井 正博;田中 正和;

    申请日2000-02-21

  • 分类号H01L21/82;G06F17/50;

  • 国家 JP

  • 入库时间 2022-08-22 01:01:32

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