首页> 外国专利> Material design support system, and storage medium storing a computer program for designing support which the material in a stable structure and dynamic behavior of the system in a computer system is analyzed by atomic or molecular level

Material design support system, and storage medium storing a computer program for designing support which the material in a stable structure and dynamic behavior of the system in a computer system is analyzed by atomic or molecular level

机译:材料设计支持系统和存储用于设计支持的计算机程序的存储介质,通过原子或分子水平分析计算机系统中系统的稳定结构和动态行为中的材料

摘要

PROBLEM TO BE SOLVED: To efficiently provide the stable structure and dynamic action or a system (asynchronous system S2 ) including disturbance without approximation in the design of a material. SOLUTION: This material design supporting system for obtaining the stable structure and dynamic action of the asynchronous system (S2 ) is provided with a reference system S0 processing part [1-1], an asynchronous system S processing part [1-2], an inter-atom potential processing part [1-3], a reference system S calculation part [1-4], an asynchronous system S calculation part [1-5], an MM calculation part [1-6] for the analysis of the stable structure and an MD calculation part [1-7] for the analysis of the dynamic action. Then, at the time of describing the structure of the asynchronous system (S2 ) by a deviation from a reference system (S0 ) and calculating the potential energy of the asynchronous system (S2 ) and force acting on respective atoms or respective molecules by using the deviation, the calculation is performed to a prescribed range (area for considering grating mitigation) including the unit cell of the reference system (S0 ) and the disturbance of the asynchronous system (S2 ).
机译:解决的问题:在没有材料设计的近似的情况下,有效地提供稳定的结构和动态动作或包括干扰的系统(异步系统S 2)。解决方案:此用于获得异步系统(S <2>)的稳定结构和动态作用的材料设计支持系统,配有参考系统S <0>处理部分[1-1],异步系统S处理部分[1-1]。 1-2],原子间电势处理部分[1-3],参考系统S计算部分[1-4],异步系统S计算部分[1-5],MM计算部分[1-6] )用于稳定结构的分析; MD计算部分[1-7]用于动态作用的分析。然后,在通过与参考系统(S <0>)的偏差描述异步系统(S <2>)的结构并计算异步系统的势能(S <2>)和作用力时通过使用偏差,对各个原子或分子进行计算,计算到规定范围(考虑光栅缓和的区域),该范围包括参考系的单位晶格(S <0>)和异步系统的扰动(S < 2>)。

著录项

  • 公开/公告号JP3335881B2

    专利类型

  • 公开/公告日2002-10-21

    原文格式PDF

  • 申请/专利权人 株式会社東芝;

    申请/专利号JP19970194035

  • 发明设计人 野崎 華恵;

    申请日1997-07-18

  • 分类号G06F17/50;

  • 国家 JP

  • 入库时间 2022-08-22 01:01:21

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号