Alignment method, an exposure method using the alignment method, a device manufacturing method using the exposure method, a device manufactured by the device manufacturing method, and alignment device, an exposure apparatus provided with the alignment device

摘要

PURPOSE:To perform alignment at a high speed by optimizing each processing condition by correcting a first coordinate position after deciding the position and, at the same time, statistically calculating the plurality of corrected first coordinates and deciding the processing conditions for the statistical calculation so that positional deviations can become smaller than allowable values. CONSTITUTION:An enhanced global alignment (EGA) calculation unit 502 carries out statistical calculation by using positional information from three arithmetic units 41-43 in accordance with an alignment mode decided by an arithmetic unit 502. The calculated results are sent to the arithmetic section 505, a storing section 506, and a sequence controller 508. A weight generating section 507 stores the deciding formulae of weighting functions and parameters. Therefore, the section 507 decides the weighting value to be given to the coordinate position of a sample shot based on the weighting parameter, the designed coordinate position of the shot area, and arrangement of the sample shot decided by the arithmetic section 505.