首页> 外国专利> METHOD OF FORMING COMPACT PEROVSKITE METALLIC OXIDE THIN FILM AND COMPACT PEROVSKITE METALLIC OXIDE THIN FILM

METHOD OF FORMING COMPACT PEROVSKITE METALLIC OXIDE THIN FILM AND COMPACT PEROVSKITE METALLIC OXIDE THIN FILM

机译:形成致密钙钙矿金属氧化物薄膜和致密钙钛矿金属氧化物薄膜的方法

摘要

PROBLEM TO BE SOLVED: To form perovskite metallic oxide thin film which can coat with thick film of 0.1 μm or more by once application, and is very compact and excellent in characteristics such as dielectric or conductive characteristics at comparatively low firing temperature of 1000°C or lower.;SOLUTION: A method of forming the perovskite metallic oxide thin film comprises the steps where liquid of raw material for forming metallic oxide thin film is applied to a substrate, the metallic oxide is crystallized and the perovskite metallic oxide film is formed by heating; the perovskite metallic oxide obtained from liquid phase part of applying liquid, forms low density film structured with granular crystal of mean grain size 200 nm or less, and compact perovskite metallic oxide thin film is obtained by sintering this low density film.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:形成钙钛矿型金属氧化物薄膜,该薄膜一次涂覆即可涂覆0.1μm或更大的厚膜,并且非常紧凑并且在相对较低的1000℃的烧成温度下具有优异的特性,例如介电或导电特性解决方案:形成钙钛矿金属氧化物薄膜的方法包括以下步骤:将用于形成金属氧化物薄膜的原料液体施加到基底上,使金属氧化物结晶,然后将钙钛矿金属氧化物膜制成。通过加热形成的;由涂布液的液相部分得到的钙钛矿型金属氧化物,形成由平均粒径为200nm以下的粒状晶体构成的低密度膜,通过烧结该低密度膜而得到致密的钙钛矿型金属氧化物薄膜。 C)2002,日本特许厅

著录项

  • 公开/公告号JP2002047011A

    专利类型

  • 公开/公告日2002-02-12

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP;

    申请/专利号JP20000234625

  • 申请日2000-08-02

  • 分类号C01G1/02;C01G23/00;C01G25/00;C01G51/00;C01G55/00;C04B35/49;H01L27/105;

  • 国家 JP

  • 入库时间 2022-08-22 00:58:18

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