首页> 外国专利> REDUCTION METHOD OF FLUORINE IN THERMAL DESORPTION GAS ANALYTICAL DEVICE CHAMBER AND THERMAL DESORPTION GAS ANALYTICAL METHOD

REDUCTION METHOD OF FLUORINE IN THERMAL DESORPTION GAS ANALYTICAL DEVICE CHAMBER AND THERMAL DESORPTION GAS ANALYTICAL METHOD

机译:热脱附气体分析装置室中氟的还原方法及热脱附气体分析法

摘要

PROBLEM TO BE SOLVED: To reduce background of fluorine in a vacuum chamber in a thermal desorption gas analytical device.;SOLUTION: This method has at least a first step for evacuating the vacuum chamber up to the prescribed degree of vacuum (S01), a second step for placing a dummy sample having silicon oxide including carbon at the rate of several percent on a sample stage in the vacuum chamber (S02), a third step for heating the dummy sample to raise the temperature at a prescribed programming rate, and to desorb the carbon from the dummy sample (S03). The carbon in the dummy sample is desorbed in the vacuum chamber, reacted and bonded actively with fluorine remaining in the vacuum chamber to form CFx-based desorption gas, and desorbed from the inner wall of an analytical chamber. The desorbed CFx-based desorption gas is exhausted by a vacuum pump.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:为了减少热脱附气体分析设备中真空室中的氟本底;解决方案:此方法至少具有将真空室排空至规定真空度(S01)的第一步。第二步是将具有包含百分之几比例的碳的氧化硅的虚拟样品放置在真空室中的样品台上(S02),第三步骤是加热虚拟样品以规定的编程速率升高温度,并且从模拟样品中解吸碳(S03)。虚拟样品中的碳在真空室中解吸,与保留在真空室中的氟发生反应并主动键合,形成基于CFx的解吸气体,并从分析室的内壁解吸。通过真空泵排出基于CFx的脱附气体。版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP2001330591A

    专利类型

  • 公开/公告日2001-11-30

    原文格式PDF

  • 申请/专利权人 TOSHIBA MICROELECTRONICS CORP;TOSHIBA CORP;

    申请/专利号JP20000151057

  • 发明设计人 NISHIZUKA MASARU;

    申请日2000-05-23

  • 分类号G01N27/62;G01N1/00;G01N1/28;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-22 00:53:37

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