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Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations
Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations
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机译:通过负角和正角过扫描内角位置处图像图案的边界来在光掩模上创建和改善图像的方法
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摘要
An method for creating an image on a photosensitive material with enhanced inside corner resolution using a raster scan exposure system. The photosensitive material may comprise a layer of an unexposed photomask. An energy beam scan is extended by one or more addressable locations beyond the boundaries of the desire pattern at inside corner locations in both X and Y axes. Thus, the image formed in the photosensitive material and, in turn, the attenuator material more accurately reflects the desired image as defined in a data file.
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