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Anti-reflection high conductivity multi-layer coating on CRT surface made by vacuum sputtering and wet coating

机译:通过真空溅射和湿涂在CRT表面上制备抗反射的高导电性多层涂层

摘要

An anti-reflection high conductivity multi-layer coating for CRT products includes three layers coating created by vacuum sputtering and a fourth layer coating created by wet coating process. A first layer, nearest to the substrate, is made of a transparent conductive oxide material having a refractive index within the approximating range of 1.85 to 2.1 at a wavelength of 520 nm. The second layer is formed from an oxide material having a refractive index within the range of 1.45 to 1.50 at a wavelength of 520 nm. The third layer is formed of an oxide material having a refractive index within the range of 1.85 to 2.2 at a wavelength of 520 nm. The fourth layer has a refractive index within the range of 1.45 to 1.55 at a wavelength of 520 nm.
机译:用于CRT产品的抗反射高导电率多层涂层包括通过真空溅射形成的三层涂层和通过湿涂工艺形成的第四层涂层。最接近基板的第一层由透明导电氧化物材料制成,该透明导电氧化物材料在波长为520 nm时的折射率在1.85至2.1的近似范围内。第二层由在520nm的波长下具有在1.45至1.50范围内的折射率的氧化物材料形成。第三层由在520nm的波长下具有在1.85至2.2范围内的折射率的氧化物材料形成。第四层在520nm的波长下具有在1.45至1.55范围内的折射率。

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