Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure

摘要

A wavefront measuring apparatus comprises a spatial image measuring instrument (59) for measuring the projected image of a specific pattern projected by a projection optical system (PL) and a wavefront measuring instrument (80) for measuring the wavefront aberration of the projection optical system. The focusing characteristics of the optical system are calculated by a main controller (50) from a measurement result by the spatial image measuring instrument and a measurement result by the wavefront measuring instrument. Therefore, the influence of the aberration included in the measurement result of the spatial image measured by the spatial image measuring instrument is corrected by the main controller from the measurement result of the wavefront aberration, so that the focusing characteristics of the projection optical system is precisely calculated. That is, the focusing characteristics of the projection optical system are precisely adjusted on the basis of the calculational result.