首页> 外国专利> Patterning method of cadmium sulfide thin film by combining microcontact printing method and selective chemical solution deposition

Patterning method of cadmium sulfide thin film by combining microcontact printing method and selective chemical solution deposition

机译:微接触印刷与选择性化学溶液沉积相结合的硫化镉薄膜构图方法

摘要

The present invention combines selective contact with chemical contact deposition and fine contact printing that can be patterned by depositing an organic thin film onto a substrate using polymer coating and depositing cadmium sulfide thin films on surfaces without organic thin films using chemical solution deposition. A method of forming cadmium sulfide and various monolayer thin films, the method comprising: forming a mold (4) having irregularities on the first substrate (2) using lithography, and forming a pattern mold (4) formed on the substrate (2). To polymerize the polymer polydimethylsiloxane (PDMS) on the upper side to form a polymer elastomer coating (6) and to coat the polymer elastomer coating (14) with an organic compound ink (14) on the second substrate (8). Forming a coating film 10 by using microcontact printing, and between the coating film 10 formed on the substrate 8, a cadmium sulfide monolayer 12 is formed by chemical solution deposition. There is a characteristic consisting of the step of forming.
机译:本发明将选择性接触与化学接触沉积和精细接触印刷相结合,可以通过使用聚合物涂层将有机薄膜沉积到基板上并使用化学溶液沉积在没有有机薄膜的表面上沉积硫化镉薄膜来进行图案化。一种形成硫化镉和各种单层薄膜的方法,该方法包括:使用光刻在第一基板(2)上形成具有凹凸的模具(4),以及在基板(2)上形成图案模具(4)。为了在上侧聚合聚合物聚二甲基硅氧烷(PDMS)以形成聚合物弹性体涂层(6),并在第二基板(8)上用有机化合物油墨(14)涂覆聚合物弹性体涂层(14)。通过微接触印刷形成涂膜10,在基板8上形成的涂膜10之间,通过化学溶液沉积法形成硫化镉单层12。具有形成步骤的特征。

著录项

  • 公开/公告号KR100337789B1

    专利类型

  • 公开/公告日2002-05-23

    原文格式PDF

  • 申请/专利权人 정덕영;

    申请/专利号KR20000004105

  • 申请日2000-01-27

  • 分类号H01L21/205;

  • 国家 KR

  • 入库时间 2022-08-22 00:29:39

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号