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Methods of plating on insulating substrates and plating grants obtained by the methods

机译:在绝缘基板上进行电镀的方法以及通过该方法获得的电镀助剂

摘要

It is an object of the present invention to provide a method capable of easily producing a thin layer of a metal having good adhesion to a substrate on an insulating substrate having a smooth surface at low cost, and a plating imparting material obtained by the method.;The present invention provides a method of plating on an insulating substrate, comprising: forming a conductive film containing an oxide on an insulating substrate, and performing a reduction treatment on the conductive film surface layer to form a reducing layer on the conductive film surface layer. And a step 3 of forming a catalyst layer on the surface of the reduced layer by applying a treatment solution containing ions of a metal having a catalytic action to the reducing layer, and plating metal on the conductive film having the catalyst layer. Characterized in that it holds.
机译:本发明的一个目的是提供一种方法,该方法能够以低成本容易地在具有光滑表面的绝缘基板上生产对基板具有良好粘附性的金属薄层,以及通过该方法获得的镀覆材料。本发明提供了一种在绝缘基板上进行电镀的方法,包括:在绝缘基板上形成包含氧化物的导电膜;以及在所述导电膜表面层上进行还原处理以在所述导电膜表面层上形成还原层。 。以及步骤3,通过将包含具有催化作用的金属离子的处理溶液施加到还原层上,并且在具有催化剂层的导电膜上电镀金属,在还原层的表面上形成催化剂层。其特征在于它成立。

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