TOTAL REFLECTION FLUORESCENT X-RAY ANALYSIS METHOD AND APPARATUS HAVING CONFIGURATION USING SAMPLE SUBSTRATE AND REFLECTOR FOR ACHIEVING MULTIPLE TOTAL REFLECTION AND CONVERGENCE OF X RAYS

摘要

PROBLEM TO BE SOLVED: To provide a total reflection fluorescent X-ray analysis method and a total reflection fluorescent X-ray analysis apparatus where a detection limit is improved.;SOLUTION: The total reflection fluorescent X-ray analysis apparatus includes a primary X-ray intensity increase means. The primary X-ray intensity increase means has a rotary stage R.S and a reflector Re. The rotary stage R.S has X-ray irradiation angle adjustment equipment Z-S for adjusting an angle (θ) between an X ray X-rb from a primary X-ray generation source and a sample substrate S.P. The reflector Re cooperates with a sample substrate mount placement rest S.P.S that is mounted to the upper section of the rotary stage and a sample substrate, is subjected to multiple total reflection, is converged, increases X-ray intensity, can be adjusted to an appropriate angle that is less than 1° of an angle where irradiation can be made by a glancing angle, and at the same time is arranged at an interval where the converged X ray passes for irradiating the section to be analyzed.;COPYRIGHT: (C)2003,JPO