首页> 外国专利> Semiconductor device having the effect that the drop in the current gain is kept to the minimum, when the substrate density is amplified and that the variation in the collector current is improved

Semiconductor device having the effect that the drop in the current gain is kept to the minimum, when the substrate density is amplified and that the variation in the collector current is improved

机译:半导体器件具有以下效果:当衬底密度被放大时,电流增益的下降保持最小,并且集电极电流的变化得到改善

摘要

A semiconductor device includes a SiGe base bipolar transistor. The SiGe base bipolar transistor includes an emitter layer, a collector layer and a SiGe base layer formed of silicon containing germanium. A Ge concentration of the SiGe base layer is increased from 0% to 10% from a side of the emitter layer towards a side of the collector layer.
机译:半导体器件包括SiGe基极双极晶体管。该SiGe基极双极晶体管包括发射极层,集电极层和由包含锗的硅形成的SiGe基极层。从发射极层的一侧到集电极层的一侧,SiGe基极层的Ge浓度从0%增加到10%。

著录项

  • 公开/公告号US6570241B2

    专利类型

  • 公开/公告日2003-05-27

    原文格式PDF

  • 申请/专利权人 NEC ELECTRONICS CORPORATION;

    申请/专利号US20010864330

  • 发明设计人 TAKASUKE HASHIMOTO;

    申请日2001-05-25

  • 分类号H01L299/30;H01L299/20;H01L290/60;

  • 国家 US

  • 入库时间 2022-08-22 00:06:14

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