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ArF and KrF excimer laser apparatus and fluorine laser apparatus for lithography
ArF and KrF excimer laser apparatus and fluorine laser apparatus for lithography
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机译:用于光刻的ArF和KrF准分子激光设备和氟激光设备
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摘要
The present invention relates to an ArF excimer laser apparatus for lithography capable of stretching the laser pulse width even when the repetition rate exceeds 4 kHz and also relates to a KrF excimer laser apparatus and fluorine laser apparatus for lithography capable of stretching the laser pulse width even when the repetition rate exceeds 2 kHz. In a laser apparatus for lithography having laser discharge electrodes disposed in a laser chamber and a peaking capacitor connected in parallel to the laser discharge electrodes, the period Tn of the waveform of an oscillating current flowing in a first circuit loop formed by the final-stage capacitor of a magnetic pulse compression circuit and the laser discharge electrode and the period Tp of the waveform of an oscillating current flowing in a second circuit loop formed by the peaking capacitor and the laser discharge electrodes satisfy the condition of 5Tp≦Tn, and the period Tn satisfies the condition of Tn250 ns, whereby a laser oscillating operation is performed by at least 2.5 cycles of the oscillating current flowing between the laser discharge electrodes.
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