TREATMENT CONDITION DECISION METHOD, TREATMENT CONDITION DECISION SYSTEM, TREATMENT SYSTEM, TREATMENT CONDITION DECISION CALCULATOR PROGRAM, PROGRAM RECORDING MEDIUM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

In step S 11 , quantities that are varied (parameters) are respectively varied in a stepwise manner at a specified pitch, and standard working conditions consisting of combinations of these parameters are determined. For all of the standard working conditions, a working is actually performed, and the treated shapes that are obtained as a result are taken as the standard treated shapes for the respective standard working conditions (step S 12 ). In cases where an appropriate simulation program is available, the standard treated shapes may be determined by simulation without actually performing a working. The standard working conditions and standard treated shapes thus determined are stored in a memory device. When the desired shape that is to be obtained by working is given in step S 13 , a standard treated shape that is close to the desired shape is sought in step S 14 . Thus, when a treated shape is given, the working conditions for this treated shape can be determined.