Method For Certifying Film Thickness Standard Reference Material For Film Thickness Measuring Equipment

摘要

PURPOSE: A method for certifying a film thickness standard reference material for equipment for measuring film thickness is provided to manufacture and authenticate the film thickness standard reference material, and establish an accurate management standard of metal film measuring equipment. CONSTITUTION: Identification is granted to each wafer(S10). A metal film is accumulated on the wafers as a standard reference film(S20). The thickness of the metal film of each wafer is measured by using non-destructive film thickness measuring equipment(S30). The wafers are divided into wafers for a transmission electron microscope and wafers for an SRM(Film Thickness Standard Reference Material)(S40). A polycrystal silicon film is accumulated on the wafers for a transmission electron microscope(S50). The film thickness of wafers for the transmission electron microscope is measured(S60). Correlation between the transmission electron microscope and the non-destructive film thickness measuring equipment(S70) is measured. The correlation is applied to the wafers for the SRM(S80). The metal film thickness of the wafers for the SRM obtained by the correlation is authenticated(S90). The wafers for the SRM are registered(S100). The non-destructive film thickness measuring equipment is compensated by using the metal film thickness of the authenticated wafers for the SRM(S110).