首页> 外国专利> Determining local thickness of layer in stack of layers in grooved optical disk, e.g. for CD-RW production, by performing measurements at at least as many different wavelengths as there are layers to be measured

Determining local thickness of layer in stack of layers in grooved optical disk, e.g. for CD-RW production, by performing measurements at at least as many different wavelengths as there are layers to be measured

机译:确定带凹槽的光盘中的层堆叠中的层的局部厚度,例如对于CD-RW生产,通过至少与要测量的层数一样多的不同波长进行测量

摘要

A measuring light beam (15) is directed at an angle of incidence between 0 and 20 degrees onto the stack (11), and the thickness of the layer is determined from the intensity light transmitted and/or reflected in zero order and at least one further diffraction order. To determine the thicknesses of adjacent layers (12,13,14) arranged between a substrate (27) and a protective layer (28), measurement is performed at at least as many different wavelengths as there are layers to be measured. An Independent claim is also included for a measuring device.
机译:测量光束(15)以0至20度的入射角入射到叠层(11)上,该层的厚度由以零级透射和/或反射的光的强度和至少一个来确定进一步的衍射顺序。为了确定布置在基板(27)和保护层(28)之间的相邻层(12、13、14)的厚度,至少以与要测量的层一样多的不同波长进行测量。测量设备也包括独立索赔。

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