首页> 外国专利> Production of compounds with perfluoroalkanesulfonic acid residues, used e.g. in electrolytes and batteries, involves reacting perfluoroalkanesulfonic anhydride with dialkyl carbonate in presence of perfluoroalkanesulfonic acid

Production of compounds with perfluoroalkanesulfonic acid residues, used e.g. in electrolytes and batteries, involves reacting perfluoroalkanesulfonic anhydride with dialkyl carbonate in presence of perfluoroalkanesulfonic acid

机译:具有例如全氟烷磺酸残基的化合物的生产。在电解质和电池中,涉及在全氟烷磺酸的存在下使全氟链烷磺酸酐与碳酸二烷基酯反应

摘要

A method for the production of compounds with perfluoroalkanesulfonic acid residues (II) involves reacting perfluoroalkanesulfonic acid anhydride with dialkyl carbonate in presence of perfluoroalkanesulfonic acid. Independent claims are also included for: (a) a method for the production of perfluoroalkanesulfonate salts (II) by reacting esters (I) with compounds of formula XR1R2R3 (III); (b) a method for the production of (II) by reacting (I) with compounds of formulae (III)-(X); (c) compounds of formula Mn+(OSO2CF3)n-; (d) liquid, gel-like or solid electrolytes containing compounds as described in (c), optionally mixed with other salts; and (e) primary and secondary batteries, condensers, super-condensers and/or galvanic cells containing compounds as in (c) or electrolytes as in (d) or compounds (I) obtained by this method. X = P or N; R1-R3 = H, 1-16C alkyl (optionally partly substituted with other groups, preferably F, Cl, N(1-6C fluoroalkyl with up to 13 F atoms)2, O-fluoroalkyl (as above), SO2-(fluoroalkyl) or fluoroalkyl, optionally substituted aryl or optionally substituted heterocyclic groups), or (1-16C alkyl)-aryl, aryl or heteroaryl (all optionally partly substituted, preferably with F, Cl, Br, NO2, CN, alkyl, aryl or heterocyclic groups), in which 1, 2 or 3 CH2 groups in alkyl or alkylene residues may be replaced by hetero-atoms, preferably O, NH or N(1-6C alkyl), and not all of the groups R1-R3 may be perfluorinated or perchlorinated at once; R1-R5 = H, halogen (preferably fluorine, but with no N-halogen bonds), 1-8C alkyl (optionally partly substituted as above), aryl, alkylaryl or (alkyl)-heterocyclic groups; Mn+ = formulae (XI)-(XIX); X, Y = P or N.
机译:具有全氟链烷磺酸残基(II)的化合物的制备方法涉及在全氟链烷磺酸的存在下使全氟链烷磺酸酐与碳酸二烷基酯反应。还包括以下独立权利要求:(a)通过使酯(I)与式XR 1 R 2 R 3(III)的化合物反应制备全氟链烷磺酸盐(II)的方法; (b)通过使(I)与式(III)-(X)的化合物反应来制备(II)的方法; (c)式为Mn +(OSO2CF3)n-的化合物; (d)含有(c)中所述化合物的液体,凝胶状或固体电解质,并任选与其他盐混合; (e)包含通过(c)中的化合物或(d)中的电解质或通过该方法获得的化合物(I)的一次和二次电池,电容器,超级冷凝器和/或原电池。 X = P或N; R 1 -R 3 = H,1-16C烷基(任选被其他基团部分取代,优选F,Cl,N(具有至多13个F原子的N(1-6C氟烷基))2,O-氟烷基(如上所述),SO2-(氟代烷基)或氟代烷基,任选取代的芳基或任选取代的杂环基)或(1-16C烷基)-芳基,芳基或杂芳基(全部任选被部分取代,优选被F,Cl,Br,NO2,CN取代) ,烷基,芳基或杂环基),其中烷基或亚烷基残基中的1、2或3个CH2基团可以被杂原子取代,最好是O,NH或N(1-6C烷基),而不是所有的基团R 1〜R 3可以一次全氟或全氯。 R 1 -R 5 = H,卤素(优选为氟,但无N-卤素键),1-8C烷基(如上任选被部分取代),芳基,烷基芳基或(烷基)-杂环基; Mn + =式(XI)-(XIX); X,Y = P或N。

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