首页> 外国专利> Process for thinning a wafer structure for chip cards comprises embedding wafer into a support material with a liquid phase in an edge region, converting support material into a support material with a liquid phase and thinning wafer

Process for thinning a wafer structure for chip cards comprises embedding wafer into a support material with a liquid phase in an edge region, converting support material into a support material with a liquid phase and thinning wafer

机译:使芯片卡的晶片结构变薄的方法包括:将晶片嵌入边缘区域中具有液相的支撑材料中;将支撑材料转换成具有液相的支撑材料;以及使晶片变薄

摘要

Process for thinning a wafer structure comprises embedding the wafer into a support material (SM) with a liquid phase in an edge region (RB), converting the support material into a support material with a liquid phase and thinning the wafer to form an ultra-thin product wafer. An Independent claim is also included for a process for producing a semiconductor component structured on both sides.
机译:薄化晶圆结构的工艺包括在边缘区域(RB)中将晶圆嵌入液相的支撑材料(SM),将支撑材料转化为液相的支撑材料以及薄化晶圆以形成超薄晶圆薄产品晶圆。还包括用于制造在两侧上构造的半导体部件的方法的独立权利要求。

著录项

  • 公开/公告号DE10139056A1

    专利类型

  • 公开/公告日2003-05-08

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2001139056

  • 发明设计人 KROENER FRIEDRICH;KOBLINSKI CARSTEN VON;

    申请日2001-08-08

  • 分类号H01L21/304;H01L21/68;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:44

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