首页> 外国专利> Floating gate memory cell for non-volatile information storage, has source/drain configuration, having two source/drain regions permitting access of all floating gates through two common source/drain regions

Floating gate memory cell for non-volatile information storage, has source/drain configuration, having two source/drain regions permitting access of all floating gates through two common source/drain regions

机译:用于非易失性信息存储的浮栅存储单元具有源/漏配置,具有两个源/漏区,允许通过两个公共源/漏区访问所有浮栅

摘要

The memory cell has a source/drain configuration accessing a floating gate configuration, having floating gates each for storing information. A control gate configuration having multiple control gates controls the access to each floating gate. The source/drain configuration having two source/drain regions permits the access of all floating gates through two common source/drain regions. An Independent claim is also included for the method for fabricating floating gate configuration.
机译:该存储单元具有访问浮栅配置的源/漏配置,其中每个浮栅均用于存储信息。具有多个控制栅的控制栅配置控制对每个浮栅的访问。具有两个源极/漏极区域的源极/漏极配置允许通过两个公共源极/漏极区域访问所有浮栅。还包括用于制造浮栅配置的方法的独立权利要求。

著录项

  • 公开/公告号DE10153493A1

    专利类型

  • 公开/公告日2003-05-15

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2001153493

  • 发明设计人 MIKOLAJICK THOMAS;

    申请日2001-10-30

  • 分类号H01L27/115;H01L21/8247;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:31

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