Membrane device for photolithography mask has quartz glass membrane frame provided with spaced gas openings along 2 opposing sides

摘要

The membrane device has a peripheral quartz glass membrane frame (3) with upper and lower openings and a membrane sheet (4) attached to the membrane frame, for covering one of these openings. The frame has a number of gas openings (1) spaced along 2 opposing sides, having a size which is 3/5 the height of the membrane frame or less.