REFLECTIVE MASK BLANK HAVING ARTIFICIAL DEFECT AND ITS PRODUCING PROCESS, REFLECTIVE MASK HAVING ARTIFICIAL DEFECT AND ITS PRODUCING PROCESS, AND SUBSTRATE FOR PRODUCING REFLECTIVE MASK BLANK OR REFLECTIVE MASK HAVING ARTIFICIAL DEFECT

摘要

PROBLEM TO BE SOLVED: To provide a reflective mask blank having an artificial defect for use in evaluation/defect inspection of a reflective mask and a reflective mask blank, and to provide a reflective mask having an artificial defect.;SOLUTION: The reflective mask blank comprises a substrate 1, and a multilayer film 3 for reflecting exposure light formed on the substrate 1. An underlying pattern 2 of specified protrusions/recesses is provided on the substrate 1, a level difference corresponding to the underlying pattern 2 is formed on the surface of the reflective multilayer film 3 provided on the underlying pattern 2 thus forming an artificial defect.;COPYRIGHT: (C)2005,JPO&NCIPI