METHOD OF FORMING BANK, BANK FORMING SYSTEM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE METHOD OF FORMING BANK, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To obtain a bank comprising a photoresist which can be used at higher temperature.;SOLUTION: The bank forming system 10 includes a coating means 20 to apply a resist 32 on a glass substrate 22 by spin coating. The resist 32 applied on the glass substrate 22 is dried by a drying means 40 to form a resist film 46. The resist film 46 is exposed along the pattern of a mask 59 by an exposure means 50. The exposed resist film 46 is dipped in a developing solution 72 constituting a developing means 70 to develop into a bank of the specified pattern. The bank 90 is placed in a vacuum chamber 80, heated by a heater 86 under reduced pressure and irradiated with UV rays by a mercury lamp 100 to polymerize. The polymerized bank 90 is subjected to thermosetting treatment by heating to the temperature equal to or higher than the post baking temperature of the resist by a thermosetting means 110, and its surface is converted to have liquid repelling property by a liquid repelling treating means 13.;COPYRIGHT: (C)2005,JPO&NCIPI