首页> 外国专利> The resolution central processing unit of vapor condition organicity halogen compound, and resolution central processing unit null of the liquid condition organicity halogen compound which applies this

The resolution central processing unit of vapor condition organicity halogen compound, and resolution central processing unit null of the liquid condition organicity halogen compound which applies this

机译:汽相有机卤素化合物的分辨率中央处理器,以及应用了该条件的液态有机卤素化合物的分辨率中央处理器null

摘要

PROBLEM TO BE SOLVED: To provide a decomposition treatment device of gaseous organic halogen compound and a decomposition treatment device of liquid organic halogen compound provided with the same device. ;SOLUTION: This decomposition treatment device of gaseous organic halogen compound is provided with a gas introducing means which guides a gaseous organic halogen compound to a thermal decomposition means, the thermal decomposition means which generates decomposition gas by subjecting the gaseous organic halogen compound to the contact thermal decomposition with a heat generator and subjecting the gaseous organic halogen compound to the thermal decomposition due to radiation heat and a gas discharging means which supplies the gaseous organic halogen compound to the thermal decomposition means via the gas introducing means and discharges the decomposition gas which is generated by thermally decomposing the gaseous organic halogen compound in the thermal decomposition means from the thermal decomposition means. Further, this decomposition treatment device of liquid organic halogen compound has a constitution which consists of the decomposition treatment device of gaseous organic halogen compound and a gasification means which gasifies liquid organic halogen compounds.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种气态有机卤素化合物的分解处理装置以及具有该装置的液态有机卤素化合物的分解处理装置。 ;解决方案:该气态有机卤素化合物的分解处理装置设有将气态有机卤素化合物引导至热分解装置的气体引入装置,该热分解装置通过使气态有机卤素化合物与气体接触而产生分解气体。利用生热器进行热分解,并使气态有机卤素化合物由于辐射热而进行热分解;以及气体排出装置,其经由气体引入装置将气态有机卤素化合物供给至热分解装置并排出分解气体。通过在热分解装置中将气态有机卤素化合物从热分解装置中热分解产生的产物。此外,该液态有机卤素化合物的分解处理装置具有由气态有机卤素化合物的分解处理装置和气化液态有机卤素化合物的气化装置组成的构造。版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP3472873B2

    专利类型

  • 公开/公告日2003-12-02

    原文格式PDF

  • 申请/专利权人 神佐 健;

    申请/专利号JP20010222010

  • 发明设计人 神佐 健;松葉 雅俊;向山 佳秀;

    申请日2001-07-23

  • 分类号B01J19/00;A62D3/00;

  • 国家 JP

  • 入库时间 2022-08-21 23:30:16

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