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METHOD OF DEPOSITING CONDUCTIVE GOLD FILM SUBSTITUTED FOR ELECTROLESS GOLD PLATING FILM USING CONDUCTIVE GOLD PASTE

机译:用导电性金膏沉积取代金的导电性金膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of easily depositing a conductive thin gold film which can be substituted for an electroless gold plating film utilized for various uses in an electronic industrial field and equivalent to that by an electroless flash gold plating method with high film thickness controllability and reproducibility.;SOLUTION: The surface of each gold hyperfine particle with a mean particle diameter of ≤100 nm is provided with a covering layer of an amine compound or the like capable of forming a coordinate bond with a gold element, and it is dispersed into an organic solvent. Using conductive gold paste with an organic acid anhydride, the derivative thereof or the like exhibiting reactivity with the amine compound or the like in the covering layer added, a coating film is deposited, and heat treatment is performed at ≤300°C, so that a thin gold film in which gold hyperfine particles are densely sintered is produced.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:提供一种容易沉积导电薄金膜的方法,该导电薄金膜可以代替电子工业领域中用于各种用途的等价的化学镀金膜,并且等效于高膜化学镀金的方法。解决方案:每个平均粒径为100 nm的金超细颗粒的表面均设有能够与金元素形成配位键的胺化合物等的覆盖层,并且将其分散在有机溶剂中。在添加的覆盖层中,使用具有有机酸酐,与胺化合物等表现出反应性的导电性金糊剂,或与胺化合物等具有反应性的衍生物等,形成涂膜,在〜300℃下进行热处理。产生了一层金超细颗粒被紧密烧结的金薄膜。;版权所有:(C)2004,日本特许厅和日本国家金属加工研究所

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