Formation manner of the formation device of the oxide thin film for optics and the oxide thin film for optics and has the oxide thin film for optics the formation item

摘要

PROBLEM TO BE SOLVED: To provide a forming device of a oxide with a high refractive index thin film in which a oxide thin film with a high refractive index can be formed on a film forming substrate without forced heating while the impact on the surface by charged particles is suppressed. SOLUTION: This device is equipped with a first vacuum chamber 2 to produce oxygen plasma of supplied oxygen by high frequency discharge, a metal plate 4 having an orifice 3 which can produce a dominant plasma flow of oxygen plasma against oxygen radicals and which is electrically insulated from the oxygen plasma, and a second vacuum chamber 5 connected with the first vacuum chamber. The second vacuum chamber 5 is equipped with a substrate 7 to be irradiated with the plasma flow dominant against oxygen radicals, and a production source 6A of vaporized particles to vaporize the vapor material of metal or metal oxide and to deposit the vapor particles on the substrate to form a film.