首页> 外国专利> METHOD AND DEVICE FOR COMBATING MUSHROOM IN PLANTS HOLDED IN A CLOSED NUTRIENT SYSTEM, ESPECIALLY IN THE GREENHOUSE GROWTH

METHOD AND DEVICE FOR COMBATING MUSHROOM IN PLANTS HOLDED IN A CLOSED NUTRIENT SYSTEM, ESPECIALLY IN THE GREENHOUSE GROWTH

机译:封闭营养系统中的植物,尤其是温室植物中的蘑菇群落的防治方法和装置

摘要

A method for combating fungal attack in plants kept in a closed nutritional system (especially a greenhouse) involves releasing free copper ions into the nutrient solution (A) using an electrode pair, consisting of a copper anode and a cathode immersed in (A), under control such that free Cu ions are present in (A) (when supplied to the plants) at 0.1-0.8 ppm. A method for combating fungal attack in plants kept in a closed nutritional system (especially a greenhouse), in which copper ions are added to the nutrient solution (A) and the concentration of (A) is continuously monitored via the conductivity and kept constant by addition of nutrients, free copper ions are released into (A) using an electrode pair, consisting of a copper anode and a cathode immersed in (A). A control unit adjusts the Cu ion release as required, such that the binding threshold of Cu ions in (A) is exceeded and free Cu ions are present in (A) (when supplied to the plants) at a concentration 0.1-0.8 (preferably 0.2-0.3) ppm. An independent claim is also included for the corresponding apparatus. - ACTIVITY : Fungicide. - MECHANISM OF ACTION : None given.
机译:一种在封闭的营养系统(特别是温室)中防治植物真菌侵害的方法,涉及使用电极对释放自由的铜离子到营养液(A)中,电极对包括浸入(A)的铜阳极和阴极,在控制下,使得(A)中的游离Cu离子(当供应给植物时)的含量为0.1-0.8 ppm。一种在封闭的营养系统(特别是温室)中防治植物真菌侵害的方法,其中将铜离子添加到营养液(A)中,并通过电导率连续监测(A)的浓度,并通过除了添加营养素外,还使用电极对将游离铜离子释放到(A)中,该电极对由浸入(A)中的铜阳极和阴极组成。控制单元根据需要调整Cu离子的释放量,以使(A)中的Cu离子结合阈值超过,并且(A)中的游离Cu离子(当供应给植物时)的浓度为0.1-0.8(最好是) 0.2-0.3)ppm。对于相应的设备也包括独立权利要求。 -活动:杀菌剂。 -作用机理:未给出。

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