首页> 外国专利> DICING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE TO PERFORM PRECISE DICING PROCESS FOR PARTIALLY DICING WAFER TO WHICH SUBSTRATE IS BONDED

DICING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE TO PERFORM PRECISE DICING PROCESS FOR PARTIALLY DICING WAFER TO WHICH SUBSTRATE IS BONDED

机译:用于制造半导体器件以执行精确切割过程的切割设备和方法,该切割过程用于将部分键合晶片的部分衬底粘合

摘要

PURPOSE: A dicing apparatus is provided to perform a precise dicing process for partially dicing a wafer to which a substrate is bonded by properly correcting the position of a rotation blade. CONSTITUTION: A wafer is mounted on a wafer stage(10). A blade(11) is disposed on the wafer stage. A light source irradiates detection light to the inside of a cutting groove which is formed in a dicing line region of the wafer by the blade. A recognition camera(15) detects the shape of the cutting groove based upon the reflection light from the cutting groove. A position correcting unit corrects the position of the blade based upon the detection result of the recognition camera so that the center line of the cutting groove is located in a predetermined position and the depth of the cutting groove becomes a predetermined value.
机译:目的:提供一种切割设备,以执行精确的切割过程,以通过适当地校正旋转刀片的位置来部分切割与基板粘合的晶片。组成:将晶圆安装在晶圆台(10)上。刀片(11)设置在晶片台上。光源将检测光照射到由刀片形成在晶片的切割线区域中的切割槽的内部。识别照相机(15)基于来自切割槽的反射光来检测切割槽的形状。位置校正单元基于识别照相机的检测结果来校正刀片的位置,使得切割槽的中心线位于预定位置,并且切割槽的深度变为预定值。

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