APPARATUS FOR COATING ELECTROMAGNETIC WAVE SHIELDING FILM CAPABLE OF PERFORMING BOTH MAGNETRON SPUTTERING COATING PROCESS AND THERMAL RESISTANT HEATING DEPOSITION PROCESS

摘要

PURPOSE: An apparatus is provided to reduce process time by performing both a magnetron sputtering coating process and a thermal resistant heating deposition process. CONSTITUTION: An apparatus comprises a chamber(100); a component support unit(110) fixed at the rear wall of the chamber, wherein the component support unit has a diameter smaller than the diameter of the chamber, and a cut-out plane(112) formed by cutting out a certain part of the outer surface of the component support unit; and a thermal resistant heater(150) mounted on the cut-out plane, and which evaporates coating materials by a thermal resistant heating. The thermal resistant heater includes a pair of boat supports(151) arranged on the cut-out plane; a boat portion(155) for containing a metal coating material to be evaporated by a thermal resistant heating; a support arm(153) extended from both sides of the boat portion, and which supports the boat portion; a boat fixing piece(152) mounted on the support arm; and a bolt(154) for fixing the support arm and the boat fixing piece at the boat support.