首页> 外国专利> NEW POLYMERS HAVING NON-CARBON TETRAVALENT SPECIES (Si, Ti, Ge, Zr, Sn) AND PHOTOIMAGEABLE COMPOSITIONS COMPRISING THE POLYMERS

NEW POLYMERS HAVING NON-CARBON TETRAVALENT SPECIES (Si, Ti, Ge, Zr, Sn) AND PHOTOIMAGEABLE COMPOSITIONS COMPRISING THE POLYMERS

机译:具有非碳四价态物种(Si,Ti,Ge,Zr,Sn)的新型聚合物以及包含该聚合物的光可成像成分

摘要

PURPOSE: Provided are polymers that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoresists that comprise such polymers, wherein the polymers preferably have organic content. CONSTITUTION: The photoimageable composition comprises a photoactive component and a polymer component, the polymer component comprising a polymer having repeat units of the following formula (I), wherein R is hydrogen or a non-hydrogen substituent; and m and n are each greater than zero, wherein the polymer has repeat units of the following formula (II), wherein R¬1 and R¬2 are different and may be hydrogen or a non-hydrogen substituent, with at least one of R¬1 and R¬2 being other than hydrogen; and x, y and z are each greater than zero. The photoimageable composition comprises a photoactive component and a polymer component, the polymer component comprising a polymer obtainable by reaction of one or more compounds of the formula: M(Y)4, wherein each M is Si, Ti, Zr, Ge or Sn; each Y is the same or different and at least two Y groups are reactive groups. The photoresist composition is suitable for imaging at 157 nm, the composition comprising a photoactive component and a polymer component, wherein the photoresist composition has Abs157/m of 1.5 or less.
机译:用途:提供具有非碳四价物种(Si,Ti,Ge,Zr,Sn)的聚合物和包含此类聚合物的光致抗蚀剂,其中所述聚合物优选具有有机含量。组成:所述可光成像的组合物包含光活性组分和聚合物组分,所述聚合物组分包含具有下式(I)的重复单元的聚合物,其中R为氢或非氢取代基; m和n分别大于零,其中聚合物具有下式(II)的重复单元,其中R 1和R 2不同并且可以是氢或非氢取代基,其中至少一个为R 1和R 2不是氢; x,y和z分别大于零。该可光成像的组合物包含光活性组分和聚合物组分,该聚合物组分包含可通过一种或多种式M(Y)4的化合物反应获得的聚合物,其中每个M为Si,Ti,Zr,Ge或Sn;每个Y相同或不同,并且至少两个Y基团是反应性基团。该光刻胶组合物适合于在157nm下成像,该组合物包含光敏组分和聚合物组分,其中该光刻胶组合物的Abs157 / m为1.5或更小。

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